Nanofabrication and Characterization of Nanostructures
Code
10424
Academic unit
Faculdade de Ciências e Tecnologia
Department
Departamento de Ciências dos Materiais
Credits
6.0
Teacher in charge
Pedro Miguel Cândido Barquinha
Weekly hours
5
Total hours
85
Teaching language
Português
Objectives
With this course the students should acquire a solid knowledge regarding the principles, operation, limits and aplicability of top-down and bottom-up nanofabrication techniques as well as of tools for nanocharacterization of thin films and devices not focused on previous courses. Given the technological character and scientific interest of this tematic, the experimental work of the students is included in the ongoing research activities of CENIMAT|I3N. In this context, students should develop both a critical side regarding the analysis of the obtained results, as well as their creativeness to surpass the problems found, which are mandatory components of any research activity.
Prerequisites
Recomended to have attended the courses of Técnicas de Caracterização de Materiais, Microelectrónica I and Microelectrónica II.
Subject matter
TP:
- Optical lithography - extension to nanoscale
- E-beam lithography
- Ion beam for nanofabrication
- E-beam/ion-beam lithography by projection and multibeam systems
- Nanofabrication by scanning probes
- Nanofabrication by replication
- Indirect nanofabrication
- Nanofabrication by bottom-up techniques
- Advanced characterization techniques for thin films: AFM, RBS, XPS, SIMS
P:
- Micro-nanofabrication and electrical characterization of FETs (conventional optical lithography, EBL, SEM-FIB-GIS)
- Nanofabrication with AFM
- Advanced characterization of nanostructures (elipsometry, AFM, SEM-EDS, EBSD)
Bibliography
M. Madou, Fundamentals of Microfabrication: The Science of Miniaturization, 2nd ed, CRC Press (2002)
Z. Cui, Micro-Nanofabrication: Technologies and Applications, Springer (2005)
M. Stepanova, S. Dew, Nanofabrication: Techniques and Principles, Springer (2012)
D. K. Schroder, Semiconductor Material and Device Characterization, 3rd ed., Wiley (2006)
N. Yao, Z. Wang, Handbook of Microscopy for Nanotechnology, Kluwer Academic Publishers (2005)
C. Brundle, C. Evans, S. Wilson, Encyclopedia of Materials Characterization, Butterworth-Heinemann (1992)
Teaching method
The program is divided in theoretical and lab classes, 2 and 3 hours per week, respectively.
The thematics are exposed in the lectures with the support of ppts having updated and detailed information, which are then given to the students. Several practical examples are presented, having always in mind to discuss the viability of implementation of the materials and processes at an industrial scale.
The lab classes try to show in practice how the nanofabrication and nanocharacterization tools mentioned in the lectures work and what are their main limitations.
The students are evaluated with two tests or alternatively a final exam (50 % of final mark), and by two reports about the lab classes (25 % each), one regarding nanofabrication of transistors, other about advanced characterization of thin films.
The frequency requires that the students attend the lab classes and that they are approved (>9.5 points) in each report.